Improvement of textured AlCu with Ta underlayer on LiNbO3 substrate
Résumé
Improving the lifetime of Surface Acoustic Wave filters requires
reduction of electromigration effects. We report on the growth
mechanism of AlCu2% film deposited by E-Beam Physical Vapor
Deposition technique. State of the art shows that the introduction
of an underlayer that alters the surface free energy can change a
film's growth mode or improve the earliest stages of film
formation. In this work, this will be achieved by using an
ultra-thin (<5nm) Ta underlayer between the LiNbO3 substrate and
the AlCu2% film. The effects of Ta underlayer on the microstructure
of AlCu2%/LiNbO3 films is investigated. An increase in the surface
energy of the LiNbO3 substrate is observed with the addition of
1.3nm thick Ta underlayer. Crystalline quality of AlCu2% thin film
with a Ta underlayer is measured with XRD techniques. A
post-deposition heat processing is also used to recrystallize the
films. The AlCu2%/1.3Ta/LiNbO3 film annealed at 250°C improved
the
Origine : Fichiers produits par l'(les) auteur(s)
MN2S Femto-st : Connectez-vous pour contacter le contributeur
https://hal.science/hal-03890951
Soumis le : jeudi 8 décembre 2022-21:06:57
Dernière modification le : samedi 16 décembre 2023-12:33:40
Citer
Hala Achahbar, Florent Bernard, Emilie Courjon, Nicolas Martin, Thomas Baron, et al.. Improvement of textured AlCu with Ta underlayer on LiNbO3 substrate. AIP Advances, 2022, 12 (10), pp.105121 - 105121-4. ⟨10.1063/5.0107058⟩. ⟨hal-03890951⟩
Collections
7
Consultations
39
Téléchargements